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Scienta Omicron MBE Systems

Scienta Omicron

Scienta Omicron MBE Systems Universal Compact Laboratory MBE Systems
  • Lab10 MBE System
  • EVO-25/50
  • PRO 75/100
  • Custom MBE Systems
  • PDFs

Universal Compact Laboratory MBE Systems




The Lab10 MBE System is the standard MBE system with a loadlock chamber  and with an optional preparation/storage chamber. The substrate size for the Lab10 MBE system is the Scienta Omicron standard sample plate.

Its proven chamber design with up to 7 effusion cells is revealed in an excellent thickness homogeneity for a 10 mm substrate. The effusion cell capacity can range from 10 cm3 up to 35 cm3 for layer growth.

The  fast & reliable sample transfer together with the excellent performance results in a low cost of ownership. The optional available easy & intuitive to operate growth control software and the possibility to add standard Scienta Omicron analysis equipment makes this a unique MBE system for researchers.

Growth Applications

  • Metal MBE growth
  • Semiconductor growth (III-V, III-N, II-VI, SiGe)
  • Magnetic materials growth
  • Oxide MBE growth
  • Organic MBE

Chamber Layout

Two standard versions of the deposition chamber are available

  • A standard cylindrical chamber with a cluster flange and ports for seven effusion cells: 7 x NW40CF (2.75“ O.D.)
  • A larger chamber diameter with with a cluster flange and ports for seven effusion cells: 3 x NW63CF (4.5“ O.D.) and 4 x NW40CF (2.75“ O.D.)

A sample preparation and storage chamber with its own pumping system is also available. Due to the modular design of the Lab10 MBE-System this chamber can be retro-fitted also at a later stage.

Chamber

  • Standard effusion cell capacity from 10 cm3 up to 35 cm3
  • EFM type e-beam evaporators
  • Rotary shutters for the effusion cells
  • Further ports on the chamber: viewports for good visibility during sample transfer, two tilted flanges for ellipsometry, flanges for a beam flux monitor, a quartz micro balance, a RGA, for venting, for pressure measurement, for a RHEED electron gun and a flange for a RHEED screen
  • Large pumping port
  • One flange perpendicular to the sample for optical measurements

General Design Aspects

The distance between the source flanges on the cluster flange and the support frame bottom is optimized for very good accessibility to all effusion cells. All shutter blades are operated from soft-acting shutter modules. The increasing/decreasing shutter movement speed follows a sinusoidal speed curve to avoid particles being flinged away by the shutter blades. Special care has been taken to allow safe operation using interlocks and convenient system control. The bakeout tent ensures homogeneous heat distribution for ultimate vacuum conditions and cleanest environment.

The system comes completely assembled and fully tested as a turn-key system.

The Lab10 MBE-Systems can be easily extended with Scienta Omicrons MULTIPROBE analysis systems providing various analysis techniques such as SPM, AFM, XPS, UPS, AES, SEM and many others without compromising the performance.

Pumping System

The standard pumping configuration for the deposition chamber consistis of an Ion Getter Pump, a Titanium Sublimation Pump and a Turbomolecular Pump with oil-free Roughing Pump. Higher pumping speeds are available on request, like a larger Ion Getter Pump or a larger Turbomolecular Pump.

The standard pumping configuration for the preparation / storage chamber consists of an Ion Getter Pump or a Turbomolecular Pump and a Titanium Sublimation Pump. The standard pumping configuration for the loadlock chamber consists of a by-pass pumping to the main Turbomolecular Pump. An option is a dedicated Turbomolecular Pump with oil-free Roughing Pump for the loadlock chamber.

The pressure measurement for the deposition chamber and for the preparation / storage chamber makes use of an Ion- and Pirani-Gauge while for the loadlock chamber an optional combined Pirani-/Cold Cathode-Gauge is used.

Sample Manipulator

The sample manipulator accepts standard Scienta Omicron small samples and is compatible with all our analysis equipment.

  • Sample size is up to 10 x 10 mm
  • movement: x/y/z-direction
  • azimuthal rotation (+/-180°)
  • optional substrate shutter

Options for heating and cooling:

  • standard: PBN heater (RT < T < 1170 K)
  • optional: e-beam heating (RT < T < 1370 K)
  • optional: high temperature heating (RT < T < 1670 K)
  • optional: tilting (+/-90°)
  • optional: LN2-cooling (140 K < T < 1130 K)

Specifications

  • Accepts all standard Scienta Omicron small samples
  • Sample heating with T > 1170 K
  • Seven ports for effusion cells: 7 x NW40CF (2.75“ O.D.) one 2.75" flange perpendicular to the sample for optical measurements
  • Vacuum base pressure < 1*10-10 mbar/torr
  • Standard chamber: 10“ diameter (254 mm) with top flange NW250CF (12" O.D.)
  • Larger chamber: 12" diameter (305 mm) with top flange NW300CF (14.25" O.D.)

 

Note: Specifications and descriptions contained in this website are subject to alteration without notice. For guaranteed specifications please inquire official documentation.

 

 


The EVO-25/50  MBE-Systems are dedicated growth systems with a loadlock chamber  and with an optional preparation/storage chamber. The substrate sizes are either 1” (EVO-25) or 2” (EVO-50). The systems of course also accept the Omicron standard sample plates.
 
The carefully designed chamber with up to 10 effusion cells shows excellent thickness uniformity for all substrate sizes. The large effusion cell capacity of to 80 cm3 for layer growth increases the up-time of the system significantly.

The fast & reliable sample transfer together with the excellent performance results in a low cost of ownership. The optional available easy & intuitive to operate growth control software and the possibility to add standard Omicron analysis equipment makes this a unique MBE system for researchers

Growth Applications

  • Metal MBE growth
  • Semiconductor growth (III-V, III-N, II-VI, SiGe)
  • Magnetic materials growth
  • Oxide MBE growth
  • Organic MBE

Three standard versions

Three standard versions of the deposition chamber, depending on the application, are available:

  • A deposition chamber with a large top flange, with a cooling shroud and with ports for ten effusion cells: 10 x NW63CF (4.5“ O.D.)
  • A deposition chamber with a large top flange, with a cooling shroud, with ports for eight effusion cells 8 x NW63CF (4.5“ O.D.) and one horizontally mounted e-beam evaporator port NW200CF (10“ O.D.)
  • A deposition chamber with a large top flange, with a cooling shroud, with ports for six effusion cells 6 x NW63CF (4.5“ O.D.) and two horizontally mounted e-beam evaporator ports NW200CF (10“ O.D.)

A sample preparation and storage chamber with its own pumping system is also available. Due to the modular design of the EVO MBE-System this chamber can be retro-fitted also at a later stage.

Chamber

  • Large effusion cell capacity from 10 cm3 up to 80 cm3 for layer growth
  • Smaller effusion cell volumes from 1.5 cm3 to 5 cm3 for doping applications
  • EBV, EBVV or EBVM type e-beam evaporators
  • Rotary shutters for the effusion cells
  • Optional linear shutter ports
  • LN2 cooling shroud
  • Further ports on the chamber: viewports for good visibility during sample transfer, two tilted flanges for ellipsometry, flanges for a beam flux monitor, a quartz micro balance, a RGA, for venting, for pressure measurement, for a RHEED electron gun and a flange for a RHEED screen
  • Large pumping port
  • One flange perpendicular to the sample for optical measurements


General Design Aspects

The distance between the source flanges on the cluster flange and the support frame bottom is optimized for very good accessibility to all effusion cells. All shutter blades are operated from soft-acting shutter modules. The increasing / decreasing shutter movement speed follows a sinusoidal speed curve to avoid particles being flinged away by the shutter blades. The customer can choose for special effusion cells with user adjustable tradeoff between thickness uniformity and material consumption by using the crucible insert technology. In addition all sources are usually mounted into water cooling shrouds and therefore reduce the LN2 consumption significantly.

Special care has been taken to allow safe operation using interlocks and convenient system control. The bakeout tent ensures homogeneous heat distribution for ultimate vacuum conditions and cleanest environment.

The system comes completely assembled and fully tested as a turn-key system.

The EVO MBE-Systems can be easily extended with Omicrons Multiprobe analysis systems providing various analysis techniques such as SPM, AFM, XPS, UPS, AES, SEM and many others without compromising the performance.

Pumping System

The standard pumping configuration for the deposition chamber consistis of an Ion Getter Pump, a Titanium Sublimation Pump and a Turbomolecular Pump with oil-free Roughing Pump.

Depending on the application, a cryopumping system can be added for highest pumping speed and ultimate base pressure during the growth process. Higher pumping speeds are available on request, like a larger Turbomolecular Pump.

The standard pumping configuration for the preparation / storage chamber consists of an Ion Getter Pump or a Turbomolecular Pump and a Titanium Sublimation Pump. The standard pumping configuration for the loadlock chamber consists of a by-pass pumping to the main Turbomolecular Pump. An option is a dedicated Turbomolecular Pump with oil-free Roughing Pump for the loadlock chamber.

The pressure measurement for the deposition chamber and for the preparation / storage chamber makes use of an Ion- and Pirani-Gauge while for the loadlock chamber an optional combined Pirani-/Cold Cathode-Gauge is used.

 Sample Manipulator

The sample manipulator for the EVO MBE-Systems accepts substrates with 1“ or 2” in diameter and smaller Omicron standard sample plates (using a suitable adaptor) and is compatible with all Omicron analysis equipment.

  • Movement: z-direction for sample transfer
  • Azimuthal rotation (cont. n*360°) with up to 50 RPM 
  • Substrate shutter

 Robust and long-lifetime heaters:

  • tantalum wire heater (RT < T < 1170 K)
  • tungsten wire heater (RT < T < 1270 K)
  • pyrolytic graphite heater (RT < T < 1470 K)
  • optional special purposes heater (e.g. for oxygen environment) using SiC heating element (RT < T < 1370 K) or special materials for compatibility with specific requirements

Specifications

  • Accepts all standard Omicron small samples and 1” or 2” substrates 
  • < 1% thickness homogenity for a 2” substrate
  • Sample heating with up to T > 1470K
  • Ten ports for effusion cells: 10 x NW63CF (4.5“ O.D.) and one 2.75" flange perpendicular to the sample for optical measurements

or

  • Eight/Six ports for effusion cells: 8/6 x NW63CF (4.5“ O.D.) plus one/two horizontally mounted e-beam evaporator ports NW200CF (10“ O.D.) and one 2.75" flange perpendicular to the sample for optical measurements
  • Vacuum base pressure < 1*10-10 mbar/torr, < 5*10-11 mbar/torr with Cryopump
  • Standard chamber: 16“ diameter (406 mm) with 18.7” top flange  (475mm O.D.)

 

Note: Specifications and descriptions contained in this website are subject to alteration without notice. For guaranteed specifications please inquire official documentation.

Professional Top-of-the-Line MBE Systems


 

The PRO-75/100  MBE-Systems are dedicated growth systems with a loadlock chamber  and with an optional preparation/storage chamber. The substrate sizes are either 3” (PRO-75) or 4” (PRO-100). The systems of course also accept smaller samples (1” and 2”) and the Omicron standard sample plates.
 
The carefully designed chamber with up to 12 effusion cells shows excellent thickness uniformity for all substrate sizes. The large effusion cell capacity of to 130 cm3 for layer growth increases the up-time of the system significantly.
The fast & reliable sample transfer together with the excellent performance results in a low cost of ownership. The optional available easy & intuitive to operate growth control software and the possibility to add standard Omicron analysis equipment makes this a unique MBE system for researchers.

Growth Applications

  • Metal MBE growth
  • Semiconductor growth (III-V, III-N, II-VI, SiGe)
  • Magnetic materials growth
  • Oxide MBE growth
  • Organic MBE

Chamber Layout

Three standard versions of the deposition chamber, depending on the application, are available:

  • A deposition chamber with a large top flange, with a cooling shroud and with ports for twelve effusion cells 7 x NW100CF (6“ O.D.) and 5 x NW63CF (4.5“ O.D.)
  • A deposition chamber with a large top flange, with a cooling shroud, with ports for nine effusion cells 5 x NW100CF (6“ O.D.) and 4 x NW63CF (4.5“ O.D.) and one horizontally mounted e-beam evaporator port NW250CF (12“ O.D.)
  • A deposition chamber with a large top flange, with a cooling shroud, with ports for seven effusion cells 4 x NW100CF (6“ O.D.) and 3 x NW63CF (4.5“ O.D.) and two horizontally mounted e-beam evaporator ports NW250CF (12“ O.D.)

A sample preparation and storage chamber with its own pumping system is also available. Due to the modular design of the EVO MBE-System this chamber can be retro-fitted also at a later stage.

Chamber

  • Very large effusion cell capacity from 10 cm3 up to 200 cm3 for layer growth
  • Smaller effusion cell volumes from 1.5 cm3 to 10 cm3 for doping applications
  • EBV, EBVV or EBVM type e-beam evaporators
  • Rotary shutters for the effusion cells
  • Optional linear shutter ports
  • LN2 cooling shroud
  • Further ports on the chamber: viewports for good visibility during sample transfer, two tilted flanges for ellipsometry, flanges for a beam flux monitor, a quartz micro balance, a RGA, for venting, for pressure measurement, for a RHEED electron gun and a flange for a RHEED screen
  • Large pumping port
  • One flange perpendicular to the sample for optical measurements

 General Design Aspects

The distance between the source flanges on the cluster flange and the support frame bottom is optimized for very good accessibility to all effusion cells. All shutter blades are operated from soft-acting shutter modules. The increasing/decreasing shutter movement speed follows a sinusoidal speed curve to avoid particles being flinged away by the shutter blades. 

The customer can choose for special effusion cells with user adjustable tradeoff between thickness uniformity and material consumption by using the crucible insert technology.

In addition all sources are usually mounted into water cooling shrouds and therefore reduce the LN2 consumption significantly. Special care has been taken to allow safe operation using interlocks and convenient system control. The bakeout tent ensures homogeneous heat distribution for ultimate vacuum conditions and cleanest environment.  

The system comes completely assembled and fully tested as a turn-key system.

The PRO MBE-Systems can be easily extended with Omicrons Multiprobe analysis systems providing various analysis techniques such as SPM, AFM, XPS, UPS, AES, SEM and many others without compromising the performance

Pumping System

The standard pumping configuration for the deposition chamber consistis of an Ion Getter Pump, a Titanium Sublimation Pump and a Turbomolecular Pump with oil-free Roughing Pump. Depending on the application, a cryopumping system can be added for highest pumping speed and ultimate base pressure during the growth process. Higher pumping speeds are available on request, like a larger Turbomolecular Pump or larger Ion Getter Pump.

The standard pumping configuration for the preparation / storage chamber consists of an Ion Getter Pump or a Turbomolecular Pump and a Titanium Sublimation Pump. The standard pumping configuration for the loadlock chamber consists of a by-pass pumping to the main Turbomolecular Pump. An option is a dedicated Turbomolecular Pump with oil-free Roughing Pump for the loadlock chamber.

The pressure measurement for the deposition chamber and for the preparation / storage chamber makes use of an Ion- and Pirani-Gauge while for the loadlock chamber an optional combined Pirani-/Cold Cathode-Gauge is used.

 

Sample Manipulator

The sample manipulator for the PRO MBE-Systems accepts substrates with 1“ to 4” in diameter and smaller Omicron standard sample plates (using a suitable adaptor) and is compatible with all Omicron analysis equipment.

  • Movement: z-direction for sample transfer
  • Azimuthal rotation (cont. n*360°) with up to 50 RPM 
  • Substrate shutter

Robust and long-lifetime heaters

  • tantalum wire heater (RT < T < 1170 K)
  • tungsten wire heater (RT < T < 1270 K)
  • pyrolytic graphite heater (RT < T < 1470 K)
  • optional special purposes heater (e.g. for oxygen environment) using SiC heating element (RT < T < 1370 K) or special materials for compatibility with specific requirements

Specifications

  • Accepts all standard Omicron small samples and 1” to 4” Substrates
  • < 1% thickness homogenity for a 4” substrate
  • Sample heating with up to T > 1470 K
  • Twelve ports for effusion cells: 7 x NW100CF (6“ O.D.) and 5 x NW63CF (4.5“ O.D.) and one 4.5" flange perpendicular to the sample for optical measurements

Or

  • Nine/Seven ports for effusion cells: 5/4 x NW100CF (6“ O.D.) and 4/3 x NW63CF (4.5“ O.D.) plus one/two horizontally mounted e-beam evaporator ports NW200CF (10“ O.D.) and one 2.75" flange perpendicular to the sample for optical measurements
  • Vacuum base pressure < 1*10-10 mbar/torr, < 5*10-11 mbar/torr with Cryopump
  • Standard chamber: 22“ diameter (559 mm) with 24.4” top flange  (620mm O.D.)

 

Note: Specifications and descriptions contained in this website are subject to alteration without notice. For guaranteed specifications please inquire official documentation.

Virtually unlimited thin film growth techniques.


 

 

Combined UHV SPM / XPS / UPS / MBE system

 

Powerful in-situ characterisation during vacuum processing
• High resolution variable temperature microscopy and spectroscopy
• Organic thin fi lm growth under well controlled conditions
• Electronic and spatial investigations of new materials for solar energy applications

UHV PLD and MULTIPROBE Compact

The customized LAB-10 Laser-MBE System is equipped with a preparation chamber for sample pre-treatment (e.g. sputtering or heating) and a loadlock for fast sample introduction. Two target stages for ablation of materials with a laser have been added as additional functionality.

Standard Omicron samples can be used for both the MBE deposition process as well as the PLD process or even simultaneously and at high temperatures. In addition to the two PLD targets, up to seven deposition sources can be attached to the growth chamber, including for example an Arsenic cracker source, effusion cells or organic material sources. In-situ growth control is realized using a differentially pumped High-Pressure RHEED system.

Charge & spin transport in graphene layers on 2 inch substrates

A new MBE system which allows experiments related to graphene heterostructures or nanoscale ferromagnets. Graphene hydrogenation after contacts are formed with a stencil mask in the main deposition chamber and the main deposition chamber itself. This chamber is equipped with a sample heater and a hydrogen source. Furthermore a second satellite chamber is being configured to allow in-situ-magneto-transport measurements. For more details please see Pico 2011.

 

III-V MBE system for film growth on 4 inch wafers

PRO-100 III-V MBE system for high-end quality film growth on 4" wafers. The system is equipped with effusion cells for Gallium, Indium, Aluminium, a valved Arsenic cracker source, doping sources, RHEED, beam flux monitor and EPI-Soft process control software. For additional information please see Pico 2010

III-N MBE system for 3 inch substrates with additional in situ VT SPM

State-of-the-Art PRO-75 III-N MBE system for 3" sized substrates with an additional in situ VT SPM directly attached. It is equipped with various effusion cells and doping sources for III-V materials growth, RHEED, beam flux monitor and EPI-Soft software. For additional information please see Pico 2010.

MBE & Catalysis

The analysis system for Catalysis Research is equipped with various surface analysis and sample preparation techniques Integrated surface spectroscopy methods are: XPS and PAX (photoemission from adsorbed Xenon) @ 50 K, UPS and LEED for quantitative chemical and structural analysis of solid surfaces and probe of local electronic structure.
Raman spectroscopy is used to identify surface species and their bonding @ up to 1 bar (atmosphere) pressure. The system is also equipped with an Electron Paramagnetic Resonance spectroscopy (EPR) @ up to 1 bar and a cyclic voltametry (CV) and electrochemistry in aqueous conditions.
The VT-STM/AFM is used for structural and compositional sample analysis. The integrated molecular beam reactor is used to measure sticking probabilities and the time evolution of surface chemical reactions