NanoFrazor Scholar
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NanoFrazor Scholar


The NanoFrazor Scholar is the entry level NanoFrazor system and is particularly suited for academic research groups looking for an easy way to create high-resolution nanopatterns or devices. The NanoFrazor Scholar is a compact system designed to fit in the smallest lab spaces. It can also be installed in a dedicated glovebox to enable nanolithography of sensitive materials in inert conditions.
Like all NanoFrazor tools, the Scholar can pattern features with ultra-high resolution with no need for proximity effect corrections. All the unique NanoFrazor capabilities like in-situ AFM imaging, accurate 3D grayscale lithography, markerless overlay or thermal material conversion are available with the Scholar.


Resolution below 20 nm

In-situ high-speed AFM topography imaging

Samples size up to 50 x 50 mm2

Closed-Loop Lithography

Precise markerless overlay and stitching using in-situ AFM

No damage of sensitive materials (no electron or ion beams)

Alternative patterning mode: direct nanoscale thermal conversion

Small footprint

Easy to use (no wet development, no vacuum, etc.)

Unique capabilities help publish in high-impact journals and receive funding for new projects


The NanoFrazor Explore covers a wide range of applications. Like E-Beam Lithography it is suitable for the fabrication of templates and prototypes of a variety of devices and components at resolutions well below 100 nm.

The NanoFrazor extends the application range of E-Beam significantly. The unique 3D capability with extreme accuracy enables novel devices and components. Furthermore, sensitive materials and devices are not damaged by high energy beam during the NanoFrazor patterning process. This is crucial for the development and improvement of future nanodevices.

Nanooptics: 3D optical elements like spiral phase plates, microlenses or holograms

Optics on the nanometer scale play an important role in fields spanning from fundamental sciences to nanotechnology applications as modern diffractive, refractive or hybrid optics often contain nanoscale patterns. Applications range from micro-lens arrays, polarization filters and Fresnel lenses to compression of ultra-short laser pulses, holograms for quality inspection, security features and advanced astronomical devices.

The NanoFrazor with its unique 3D capabilities is an ideal tool to create arbitrary, smooth and nanometer-resolved surface profiles necessary to enable novel optics applications on the nanometer scale.


Minimum structure size [nm] 20

Minimum lines and spaces [half pitch, nm] 30

Grayscale / 3D-resolution (step size in PPA) [nm] 3

Writing field size [X μm x Y μm] 50 x 50

Field stitching accuracy (markerless, using in-situ AFM imaging) [nm] 50

Overlay accuracy (markerless, using in-situ AFM imaging) [nm] 50

Write speed (typical scan speed) [mm/s] 0.5

Write speed (50 nm pixel) [μm2/min] 500

Lateral imaging resolution (feature size) [nm] 10

Vertical resolution (topography sensitivity) [nm] 0.2

Imaging speed (@ 50 nm resolution) [μm2/min] 500


The NanoFrazor Scholar is designed for high robustness and reliability. It is divided into two parts. The table-top patterning module comprises the mechanics which are mounted on a granite table on top of a high-end active vibration isolation table. The second part is a closed 19-inch rack for controllers and electronics, which fits under a table. The compact footprint of the mechanics allows the NanoFrazor Scholar a large degree of flexibility where it is set up, for example it may also be operated inside a glove box.

  • Dimensions of the patterning module (excl. vibration isolation): L50 cm x W40 cm x H30 cm
  • Weight patterning module 50 kg
  • Dimensions controller box L60 cm x W56 cm x H66 cm
  • Weight controller box: 60 kg


XY positioner

  • travel range: 50 mm
  • sensor resolution: 1 nm
  • velocity: up to 20 mm/s

Z positioner

  • travel range: 20 mm
  • sensor resolution: 1 nm
  • velocity: up to 20 mm/s

Positioning system controller

  • closed-loop control module
  • optical sensor connections for X, Y and Z
  • output drive voltage for X, Y and Z: 100 V DC
  • input power supply: 120 / 240 V AC
  • Module for 19-inch rack in the electronics rack


  • Modern user interface based on Qt
  • Interactive graphs, including zoom and panning, cross-section tools and live 3D-graphs
  • Detailed user manual with screen shots, examples and an extensive knowledge base
  • Integrated contextual help in all panels explaining the important parameters
  • HTML-based data logging for automated documentation
  • Option to save and load user settings for different parameter configurations
  • User scripting API in Python 3 using the integrated editor or any Python development environment


  • Real time processor: 1 GHz
  • Microcontrollers: 2 x 200 MHz
  • Effective pattern generator clock frequency: 10 MHz
  • Synchronous DAC + ADC channels: 4 + 4 with up to 24bits
  • USB connection: 1
  • Analog in- and outputs for the cantilever signals
  • Analog in- and outputs for the X, Y and Z
  • Dedicated analog front-end box in close proximity to the cantilever
  • 19-inch rack-mount housing in rear electronics compartment