Arradiance
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Arradiance GEMStar XT-P The GEMStar XT-DPTM Plasma Enhanced Atomic Layer Deposition (PEALD) system extends the capabilities of the GEMStar XTTM Thermal system to include best in class plasma processing through the full ... Applications: Thin films, Optical crystals, Catalysis, ... Features: 300 Watt Air Cooled Direct ICP Head with four metal sealed mass flow controlled plasma gas inputs, 300 Watt Air Cooled Direct ICP Head with four metal sealed mass flow controlled plasma gas inputs, ... Techniques: , ... -
Arradiance GEMStar XT-R Not yet ready for PEALD development, the GEMStar XT-RTM Thermal Atomic Layer Deposition systems offers 300 °C (500 °C optional) ALD processing through the full range of substrates Applications: Magnetic properties, Thin films, Catalysis, ... Features: , 300 Watt Air Cooled Direct ICP Head with four metal sealed mass flow controlled plasma gas inputs, ... Techniques: , ... -
Arradiance GEMStar XT-S The GEMStar XT-S/DTM Thermal Atomic Layer Deposition system offers 300 °C (500 °C optional) ALD processing through the full range of substrates, including Solar Cell ALD development. Applications: Coating, Thin films, Microscopy, ... Features: Pulsed Vapor Push (PVPTM) to handle very low pressure material, Pulsed Vapor Push (PVPTM) to handle very low pressure material, ... Techniques: , ...