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µLaser
Mutech Microsystems
Mutech offers projects, systems and equipment for the promotion of science, technology and education in the areas of microfabrication, micro and nano mechanics and electronics. The company is interested in promoting, through the development and commercialization of high-tech equipment, the training of quality human resources, to simplify the generation of new knowledge and to improve the access of the productive sector to new technology.µLaser is a high value direct laser lithography writer, oriented to universities and research facilities looking to expand their capabilities. It writes on a photosensitive resist coated surface with a 405nm laser at submicron pixel resolution on big areas. You can write anything from photomasks to research prototypes for basic or applied science, the integrated camera can be used to align the writing with existing features. The system is optimized for ease of use and simple maintenance, maximizing the use of off-the-shelf parts without sacrificing writing quality or capabilities.
Specifications
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Mechanics |
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Size (WxDxH) |
510 x 360 x 455 mm |
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Weight |
16 kg |
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Power |
110v/220v 400w |
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XY stage |
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Typical writing speed |
100-120 mm/s |
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Maximum area |
100x92 mm^2 |
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Unidirectional positioning step |
X = 0.16 µm, Y = 1.00 µm |
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Mechanical noise on the X and Y axis |
< 1 µm |
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Multi layer aligning accuracy |
5-10 µm (Optional rotary stage for easier aligning) |
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Realistic minimum feature size: 3-5µm depending on the feature |
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Software |
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Supported formats |
PNG,GDSII |
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In-software transformations |
Rotation, Reflection, Inversion, Rescaling, Add border |
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Multiple designs from different files can be written in one process |
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Tilted/warped substrate compensation via 3-point linear or 4-point bilinear focus measurement |
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Mesh type calibration for full-bed curvature compensation |
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Unidirectional or bidirectional writing modes |
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Optics |
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Laser wavelength |
405nm (Optional 375nm) |
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Confocal microscope for laser focusing, aligning and inspection |
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Secondary independent yellow illumination |
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Laser spot size can be changed using industry standard microscope objectives |
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Included objectives |
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Raster step |
Speed on big areas (unidirectional) |
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Fine |
0.8 µm |
1.7 mm^2/min |
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Medium-fine |
0.96 µm |
2.04 mm^2/min |
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Medium |
2 µm |
4.25 mm^2/min |
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Coarse |
5 µm |
10.6 mm^2/min |
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Speed doubles in bidirectional writing mode |
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Features
• 100x92 mm² writing area• 3-5µm feature size
• Options for writing on SU8/Epoxy photoresists
• Ultra compact design ideal for fume hood or glove box usage
• Integrated confocal microscope for laser focusing, aligning and inspection
• Laser spot size can be changed using industry standard microscope objectives
• Tilted/warped substrate compensation via 3-point focus or 4-point bilinear measurement
• Multiple designs from different files can be written in one process
Options
Low cost laser for epoxy photoresists
375nm Laser
Rotary stage for alignmentAdvantages
High resolution lithography: µlaser can get to sub-micron resolution and produce 5 µm features.
Big writing area: You can make full size photomasks for production or in-house usage.
User friendly software: µlaser is controlled from an user friendly software on a laptop. It can import GDSII files and PNG images
Change spot sizes easily: The last lens is an industry standard microscope objective. Replace it to change the spot size! Four microscope objectives are included.
Use the optics for inspection: Using the confocal yellow illumination and camera you can use the µLaser as a microscope.
Lower price than the competition: We have managed to keep the prices low allowing you to have a better lab on a tight budget.
Ultra compact design: microLaser size is only 510x360x455mm and weighs 16kg, making it ideal for use inside of a fume hood or a glove box. Reducing requirements and improving the cleanliness of microfabrication processes.
Options for epoxy photoresist writing: We offer low cost options for direct laser pattering of SU-8/epoxy photoresists for microfluidics and MEMS applications.Software
µLaser is delivered with its control software on a PC. It allows you to import the designs to be written from cells of GDSII files or directly from PNG images. Everything is done from a user friendly graphical interface that allows you preview the design to write before executing it.
Multiple designs can be combined in a single process, in addition to applying transformations such as rotations, reflections, inversions or scale adjustments to each design.
After defining the design, the included stage control modules and the confocal microscope are used.
With them you set the origin position of the process on the substrate and the focal plane on the photosensitive surface.
Next the process is executed and the design is written on the surface.
